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FF880-SDi01-t3-25×36
880 nm BrightLine® multiphoton 2P short-pass super-resolution / TIRF dichroic beamsplitter
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Description
Dispo
Prix
FF880-SDi01-t3-25×36
880 nm BrightLine® multiphoton 2P short-pass super-resolution / TIRF dichroic beamsplitter
1 à 2 semaines*
935€
*sujet à variation en fonction des stocks disponibles.
Courbe de réponse
FF880-SDi01-t3-25×36
Innovative short pass dichroic beamsplitter optimized for 2-photon laser excitation in a standard epi-fluorescence microscope configuration with reflected excitation and transmitted emission.
The 2-photon (Green & Red) and 3-photon (Green) excitation regions are ideal for femtosecond pulsed lasers such as 920 nm, Ti:Sapphire, OPO or OPA coupled, and neodymium- and ytterbium-doped lasers, enabling deep tissue imaging with improved contrast. This multiphoton dichroic has low reflected GDD that helps minimize temporal pulse broadening of reflected 910 nm to 1400 nm laser pulses, and very high and flat reflection and transmission bands.
Semrock’s Super-resolution / TIRF dichroics are available in two thicknesses and deliver industry-leading flatness for minimal focus shift and optical wavefront aberrations of the laser beam spot to enable popular imaging and super-resolution techniques such as TIRF, PALM, STORM, structured illumination, STED, and multiphoton imaging.
2.5λ P-V RWE on 1 mm, optimized for reflecting laser beams up to 6 mm in diameter while minimizing RWE
λ/3 P-V RWE on 3 mm, optimized for reflecting laser beams up to 16.7 mm in diameter while minimizing RWE
size
25.2 mm x 35.6 mm x 3.0 mm
shape
rectangular
mounted
false
substrate.type
low-autofluorescence optical quality glass
scratch-dig
60-40
tavg-and-passband-range.1
Tavg > 90% 400 – 850 nm
tavg-and-passband-range.2
Tavg > 80% 400 – 420 nm (Rolling Window: 10 nm)
tavg-and-passband-range.3
Tavg > 90% 420 – 850 nm (Rolling Window: 10 nm)
edgewl.1
835 nm
ravg-and-passband-range.1
Ravg > 94% 910 – 1400 nm
ravg-and-passband-range.1(p-pol)
Ravg > 90% 910 – 1400 nm
ravg-and-passband-range.1(s-pol)
Ravg > 98% 910 – 1400 nm
laserwls.1
910 - 1400 nm
aoi
45 ± 1.5 degrees
cha
2 degrees
Optical.Damage.Rating
1 J/cm² @ 532 nm (10 ns pulse width)
Effective.Index
GDD
± 1250 fs² over 910 - 1225 nm reflection band for S-Pol and P-Pol
GDD.2
± 500 fs² over 1225 - 1400 nm reflection band for S-Pol and P-Pol
Flatness.RWE
RWE.1
< 2.5λ P-V RWE @ 632.8 nm
RWE.3
< 0.33λ P-V RWE @ 632.8 nm
MaxBeamDia.1
6 mm
MaxBeamDia.3
16.7 mm
Transverse.Dimensions.(LxW)
25.2 mm x 35.6 mm
Transverse.Tolerance.(mounted)
± 0.1 mm
Filter.Thickness.1.(unmounted)
1.05 mm
Filter.Thickness.Tolerance.1.(unmounted)
± 0.05 mm
Filter.Thickness.3.(unmounted)
3.0 mm
Filter.Thickness.Tolerance.3.(unmounted)
± 0.1 mm
Clear.Aperture
? 80% (elliptical)
Substrate.Type
Fused Silica
Substrate Thickness (1 mm, unmounted)
1.05 mm
Substrate Thickness Tolerance (1 mm, unmounted)
± 0.05 mm
Substrate Thickness (3 mm, unmounted)
3.0 mm
Substrate Thickness Tolerance (3 mm, unmounted)
± 0.1 mm
Orientation
Reflective surface marked with laser dot - Orient in direction of incoming light